PELCO® 200nm Silicon Nitride Support Films for TEM AFM Calibration Specimens ultrathin and electron transparent metallic

ultrathin and electron transparent metallic films have a high surface energy and therefore more suitable for fabrication processes

Resistant to UV and nuclear radiation

so there will be a much lower level of background radiation in X-ray spectra

025 Ωcm Antimony (n) doped Si Cantilever Thickness (Nom): 4 Cantilever Thickness (RNG): 3

Size: 51 x 71mm (2" x 2

PELCO® 200nm Silicon Nitride Support Films for TEM AFM Calibration Specimens ultrathin and electron transparent metallicDESCRIPTION PRODUCT SPECIFICATIONS 200nm membrane thickness 200m frame thickness 21525 10 21525 100 21520 10 21520 100 21521 10 21521 100 21522 10 21522 100 21524 10 21524 100 21528 10 21529 10 Silicon Nitride Support Film, 200nm with 0. 25 x 0. 25mm Window Silicon Nitride Support Film, 200nm with 0. 25 x 0. 25mm Window Silicon Nitride Support Film, 200nm with 0. 5 x 0. 5mm Window Silicon Nitride Support Film, 200nm with 0. 5 x 0. 5mm Window Silicon